Sen-Shan Yang

Title: Innovations of Sen-Shan Yang in Semiconductor Technology

Introduction

Sen-Shan Yang is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on improving the performance and reliability of integrated circuits.

Latest Patents

One of his latest patents is a method of reducing stress migration in integrated circuits. This method involves two anneal steps, with the first step occurring at a low temperature for a short duration. After cooling the wafer to room temperature, a second anneal step is performed at a higher temperature for an extended period to enhance performance. Another notable patent is for local electrochemical deplating of alignment mark regions of semiconductor wafers. This invention utilizes a tank with an electrolytic solution, where a primary cathode and an electrochemically metal plated semiconductor wafer act as an anode. The process allows for the electrochemical deplatation of metal from alignment mark regions, effectively exposing the alignment marks.

Career Highlights

Sen-Shan Yang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches have contributed to advancements in semiconductor manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Chen-Ming Huang and Ying-Chen Chao, who are also recognized figures in the semiconductor field.

Conclusion

Sen-Shan Yang's contributions to semiconductor technology through his patents demonstrate his expertise and commitment to innovation. His work continues to influence the industry and improve integrated circuit performance.