Company Filing History:
14 out of 35,756 
5 out of 256 
3 out of 13 Years Active: 1991-2002
Title: Innovations by Seiji Samukawa: A Pioneer in Plasma Processing
Introduction
Seiji Samukawa is a prominent inventor based in Tokyo, Japan, known for his significant contributions to the field of plasma processing. With a remarkable portfolio of 14 patents, Samukawa has developed innovative methods and technologies that have advanced semiconductor manufacturing processes. His inventiveness and dedication have made him a respected figure within the industry.
Latest Patents
Among his notable inventions, two latest patents stand out. The first, titled "Plasma Processing with Energy Supplied," involves generating plasma using a process gas and injecting an electron beam to control the electron energy distribution within the plasma. This breakthrough allows for the processing of semiconductor substrates by utilizing plasma with a precisely controlled electron energy distribution.
The second patent, "Process and Apparatus for Treating a Substrate," outlines a method to produce a desirable amount of radicals and ions for various substrate treatments, such as etching and thin film deposition. In this process, a treating gas containing both strongly and weakly bonded halogen elements is employed. Active species are produced by exciting the treating gas without breaking strong chemical bonds, allowing for effective substrate treatment using a range of excitation means, including electron beams and UHF plasma.
Career Highlights
Seiji Samukawa has had a distinguished career, collaborating with leading companies, including NEC Corporation and Anelva Corporation. His work at these organizations has enabled him to explore advanced technologies in semiconductor manufacturing and plasma processing, cementing his reputation as an innovator and thought leader in the field.
Collaborations
Throughout his career, Samukawa has worked alongside talented colleagues, including Yukito Nakagawa and Tsutomu Tsukada. These collaborations have enhanced his research and development efforts, leading to groundbreaking patents and innovative solutions within the industry.
Conclusion
Seiji Samukawa's contributions to plasma processing technology have not only advanced the capabilities of semiconductor fabrication but have also set a benchmark for future innovations. With his impressive portfolio of patents and collaborations with esteemed companies and professionals, Samukawa continues to be a significant force in the field of invention and innovation. His work exemplifies the impact that dedicated inventors can have on technology and industry advancement.