The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 1998

Filed:

Nov. 14, 1996
Applicant:
Inventors:

Keizo Kinoshita, Tokyo, JP;

Seiji Samukawa, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H / ;
U.S. Cl.
CPC ...
250251 ;
Abstract

The present invention provides a neutral particle beam treatment apparatus which includes the following elements. A plasma generator is provided for generating a plasma from a treatment gas by alternation of application and discontinuation of a high frequency field. A negative ion accelerator is also provided for fetching negative ions from the plasma generated by the plasma generator and acceleration thereof to cause a negative ion beam. A neutralizer is further provided for neutralizing the negative ion beam to cause a neutral particle beam. A holder is still further provided for holding a sample at a position at which the neutral particle beam is irradiated.


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