The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 1995
Filed:
Jan. 27, 1994
Seiji Samukawa, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A radio frequency electron cyclotron resonance (RF.multidot.ECR) plasma etching apparatus in which electron cyclotron resonance is caused to occur by radio frequency waves of 100-500 MHz introduced in by an antenna. The antenna is disposed within a plasma-producing chamber and connected to a coaxial cable for introducing the radio frequency waves. A plurality of permanent magnets are provided for producing magnetic fields that perpendicularly intersect electric fields produced around the antenna within the plasma-producing chamber. A process gas forms plasma to the electron cyclotron resonance phenomena resulting from the electric fields generated by the radio frequency waves and the magnetic fields perpendicularly intersecting the electric fields in the plasma-producing chamber. The plasma thus produced is applied to the substrate for etching.