Tokyo, Japan

Seiichi Ohta

USPTO Granted Patents = 4 

 

Average Co-Inventor Count = 5.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2016-2024

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4 patents (USPTO):Explore Patents

Title: Seiichi Ohta: Innovator in Adhesion-Preventing Materials

Introduction

Seiichi Ohta is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of adhesion-preventing materials, holding a total of 4 patents. His innovative work addresses critical challenges in medical and industrial applications.

Latest Patents

One of Ohta's latest patents focuses on an adhesion-preventing composition. This invention includes a sterilized biocompatible sponge-like laminate, which consists of a sponge-like first layer and a sponge-like second layer. Each layer is at least partially crosslinked with a curing agent and contains a low-endotoxin alginic acid monovalent metal salt. The first layer's alginic acid monovalent metal salt has a weight average molecular weight ranging from 10,000 to 2,000,000, while the second layer's salt has a weight average molecular weight of 1,000 to 1,000,000. The weight average molecular weights are measured using a GPC-MALS method after a decrosslinking treatment. Notably, the weight average molecular weight of the alginic acid monovalent metal salt in the first layer is higher than that in the second layer.

Career Highlights

Seiichi Ohta has worked with notable organizations, including Tokyo Seimitsu Co., Ltd. and The University of Tokyo. His experience in these institutions has allowed him to develop and refine his innovative ideas in adhesion prevention.

Collaborations

Ohta has collaborated with esteemed colleagues such as Yuichi Ozawa and Hiroshi Nishimura. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Seiichi Ohta's work in adhesion-preventing materials showcases his innovative spirit and dedication to solving complex problems. His contributions continue to impact various fields, demonstrating the importance of research and development in advancing technology.

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