This inventor holds 16 USPTO granted patents. Top assignees: Seiko Epson Corporation, Kabushiki Kaisha Suwa Seikosha, Si Diamond Technology, Inc.. Active years: 1983-2007.
Location History:
- Suwa, JP (1983 - 1996)
- Nagano, JP (1991 - 2007)
Company Filing History:
9 out of 34,209 
4 out of 446 
3 out of 81 Years Active: 1983-2007
Title: Seiichi Iwamatsu: Innovator in Electron Beam Lithography
Introduction
Seiichi Iwamatsu is a prominent inventor based in Suwa, Japan. He has made significant contributions to the field of electron beam lithography, holding a total of 16 patents. His innovative work has advanced the technology used in various applications, particularly in the semiconductor industry.
Latest Patents
Iwamatsu's latest patents include an electron beam duplication lithography method and apparatus. This technology focuses on the precise emission of electrons from a mask plate, utilizing an electric field between the mask plate and a duplication plate. The irradiation of electrons is enhanced through the use of electric field lenses or magnetic field lenses. This method allows for the lithography of congruent or similar patterns onto an electron beam resist film, derived from a field emission film that mirrors the desired pattern.
Career Highlights
Throughout his career, Iwamatsu has worked with notable companies, including Seiko Epson Corporation and Kabushiki Kaisha Suwa Seikosha. His experience in these organizations has contributed to his expertise in the field of electron beam technology and lithography.
Collaborations
Iwamatsu has collaborated with various professionals in his field, including his coworker Shoichi Komatsu. These collaborations have fostered innovation and the development of advanced technologies in electron beam lithography.
Conclusion
Seiichi Iwamatsu's contributions to electron beam lithography have established him as a key figure in the field. His patents and career achievements reflect his dedication to innovation and technological advancement.