The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 1985
Filed:
Nov. 02, 1982
Applicant:
Inventor:
Seiichi Iwamatsu, Suwa, JP;
Assignee:
Kabushiki Kaisha Suwa Seikosha, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05G / ; H01J / ;
U.S. Cl.
CPC ...
378119 ; 378 34 ; 378 43 ;
Abstract
An X-ray source for producing high intensity X-rays. The X-ray source includes a vessel filled with an inert gas. An energizing mechanism such as a magnetic coil causes the gas to enter a pinch, plasma state which produces high intensity X-rays. The vessel includes a window through which the X-rays are radiated. In a second embodiment, a laser or electron beam bombards a crystal of selected material to produce the X-rays. The material, when gasified, does not interfere with radiation of the X-rays.