Scott R Sayles

Title: Scott R Sayles: Innovator in Sputtering Technology

Introduction

Scott R Sayles is a notable inventor based in Mead, WA (US). He has made significant contributions to the field of sputtering technology, holding a total of 5 patents. His work primarily focuses on enhancing the efficiency and purity of sputtering chambers.

Latest Patents

Among his latest patents is the invention titled "Sputter trap having a thin high purity coating layer and method of making the same." This patent describes an aluminum or copper alloy sputtering chamber that features a front surface, a back surface, and a sputter trap formed on at least a portion of the front surface. A coating of titanium particles is applied to the sputter trap to improve its performance. Another notable patent is also titled "Sputter trap having a thin high purity coating layer and method of making the same." This invention details a sputtering chamber component that includes a front surface, a back surface, and a sputter trap formed on at least a portion of the back surface. The coating of metallic particles formed on the sputter trap is designed to be substantially free of impurities, with a thickness ranging from about 0.025 mm to about 2.54 mm (0.001 inches to about 0.1 inches).

Career Highlights

Scott R Sayles is currently employed at Honeywell International Inc., where he continues to innovate and develop new technologies in the field. His work has been instrumental in advancing the capabilities of sputtering chambers, making them more efficient and effective for various applications.

Collaborations

Throughout his career, Scott has collaborated with talented individuals such as Jaeyeon Kim and Patrick K Underwood. These collaborations have contributed to the successful development of his patented technologies.

Conclusion

Scott R Sayles is a prominent figure in the field of sputtering technology, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to impact the industry positively.