The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2024
Filed:
Jan. 09, 2023
Applicant:
Honeywell International Inc., Charlotte, NC (US);
Inventors:
Jaeyeon Kim, Liberty Lake, WA (US);
Patrick Underwood, Charlotte, NC (US);
Susan D. Strothers, Mead, WA (US);
Shih-Yao Lin, Hsinchu, TW;
Michael D. Payton, Rockford, WA (US);
Scott R. Sayles, Mead, WA (US);
Assignee:
Honeywell International Inc., Charlotte, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 14/56 (2006.01);
U.S. Cl.
CPC ...
C23C 14/564 (2013.01); C23C 14/3407 (2013.01); H01J 37/3435 (2013.01); H01J 37/3491 (2013.01);
Abstract
An aluminum or copper alloy sputtering chamber includes a front surface, a back surface opposite the front surface, and a sputter trap formed on at least a portion of the front surface A coating of titanium particles is formed on the sputter trap.
Kim, Jaeyeon. (2024). Sputter trap having a thin high purity coating layer and method of making the same (U.S. Patent No. 11981991). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11981991
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile