The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Apr. 13, 2020
Applicant:
Honeywell International Inc., Morris Plains, NJ (US);
Inventors:
Jaeyeon Kim, Liberty Lake, WA (US);
Patrick K. Underwood, Spokane Valley, WA (US);
Susan D. Strothers, Mead, WA (US);
Michael D. Payton, Rockford, WA (US);
Scott R. Sayles, Mead, WA (US);
Assignee:
Honeywell International Inc., Charlotte, NC (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); H01J 37/34 (2006.01); C23C 4/08 (2016.01); C23C 24/04 (2006.01); C23C 14/02 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3407 (2013.01); C23C 4/08 (2013.01); C23C 14/028 (2013.01); C23C 24/04 (2013.01); H01J 37/3414 (2013.01); H01J 37/3423 (2013.01); H01J 37/3426 (2013.01); H01J 37/3429 (2013.01); H01J 37/3491 (2013.01);
Abstract
A sputter trap formed on at least a portion of a sputtering chamber component has a plurality of particles and a particle size distribution plot with at least two different distributions. A method of forming a sputter trap having a particle size distribution plot with at least two different distributions is also provided.