Company Filing History:
Years Active: 2002-2014
Title: Sal Umotoy: Innovator in Substrate Processing Technologies
Introduction
Sal Umotoy is a notable inventor based in Antioch, CA (US), recognized for his contributions to substrate processing technologies. With a total of 5 patents to his name, Umotoy has made significant advancements in methods for removing oxides from substrate surfaces, which are crucial in various manufacturing processes.
Latest Patents
Umotoy's latest patents include innovative methods that enhance the efficiency of substrate processing. One of his patents, titled "Method for Removing Oxides," describes a technique that involves positioning a substrate with an oxide layer into a processing chamber. The method exposes the substrate to a gas mixture while forming a volatile film, maintaining the substrate at a temperature below 65°C, and subsequently heating it to at least 75°C to sublimate the film and remove the oxide layer. Another patent, "Method for Front End of Line Fabrication," outlines a process for removing native oxides from a substrate surface by generating a plasma of reactive species and cooling the substrate to facilitate the reaction with silicon oxide.
Career Highlights
Umotoy is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work focuses on developing advanced techniques that improve the fabrication processes in semiconductor manufacturing. His innovative approaches have contributed to the efficiency and effectiveness of substrate processing.
Collaborations
Throughout his career, Umotoy has collaborated with esteemed colleagues, including Chien-Teh Kao and Jing-Pei (Connie) Chou. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies in the field.
Conclusion
Sal Umotoy's contributions to substrate processing technologies through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor manufacturing.