The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
May. 24, 2005
Chien-teh Kao, Sunnyvale, CA (US);
Jing-pei (Connie) Chou, Sunnyvale, CA (US);
Chiukin (Steven) Lai, Sunnyvale, CA (US);
Sal Umotoy, Antioch, CA (US);
Joel M. Huston, San Jose, CA (US);
Son Trinh, Cupertino, CA (US);
Mei Chang, Saragoga, CA (US);
Xiaoxiong (John) Yuan, Cupertino, CA (US);
Yu Chang, San Jose, CA (US);
Xinliang LU, Sunnyvale, CA (US);
Wei W. Wang, Cupertino, CA (US);
See-eng Phan, San Jose, CA (US);
Chien-Teh Kao, Sunnyvale, CA (US);
Jing-Pei (Connie) Chou, Sunnyvale, CA (US);
Chiukin (Steven) Lai, Sunnyvale, CA (US);
Sal Umotoy, Antioch, CA (US);
Joel M. Huston, San Jose, CA (US);
Son Trinh, Cupertino, CA (US);
Mei Chang, Saragoga, CA (US);
Xiaoxiong (John) Yuan, Cupertino, CA (US);
Yu Chang, San Jose, CA (US);
Xinliang Lu, Sunnyvale, CA (US);
Wei W. Wang, Cupertino, CA (US);
See-Eng Phan, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A lid assembly for semiconductor processing is provided. In at least one embodiment, the lid assembly includes a first electrode comprising an expanding section that has a gradually increasing inner diameter. The lid assembly also includes a second electrode disposed opposite the first electrode. A plasma cavity is defined between the inner diameter of the expanding section of the first electrode and a first surface of the second electrode.