Company Filing History:
Years Active: 2008-2014
Title: Innovations by Chiukin (Steven) Lai in Oxide Removal Technologies
Introduction
Chiukin (Steven) Lai is an accomplished inventor based in Sunnyvale, California, who has made noteworthy contributions in the realm of semiconductor processing with a total of four patents to his name. His work primarily focuses on methods for the removal of native oxides from substrate surfaces, which is crucial in the fabrication of advanced electronic components.
Latest Patents
Lai's latest patents detail innovative methods for oxide removal. The first patent outlines a method for removing native oxides by positioning a substrate with an oxide layer in a processing chamber. The substrate is exposed to a specific gas mixture, forming a volatile film while maintaining a temperature below 65°C. Subsequently, heating the substrate to at least 75°C facilitates the sublimation of the volatile film, effectively removing the oxide layer prior to subsequent layer deposition.
Another patent by Lai describes a method for front-end fabrication, whereby a substrate containing silicon oxide is supported within a processing chamber. This method involves generating a plasma of reactive species from a gas mixture and cooling the substrate to less than 65°C. The reactive species interact with the silicon oxide, forming a film that consists of ammonium hexafluorosilicate. The process concludes with heating the substrate to overcome the reaction by sublimating or removing the film.
Career Highlights
Chiukin (Steven) Lai is currently employed by Applied Materials, Inc., a leading company in the development of materials engineering solutions for the semiconductor industry. His patents reflect a deep understanding of substrate processing technologies that can enhance fabrication efficiency and device performance in the semiconductor sector.
Collaborations
Lai has collaborated with notable professionals within his field, including coworkers Chien-Teh Kao and Jing-Pei (Connie) Chou. These collaborations have contributed to the innovative approaches and methodologies he has developed, leading to significant advancements in oxide removal techniques.
Conclusion
Chiukin (Steven) Lai's contributions to oxide removal technologies are significant in the context of semiconductor manufacturing. His work demonstrates an innovative application of gas mixture processes and plasma technology, marking him as an influential inventor in this vital industry. With his continuous research and patents, Lai is poised to further impact the field of semiconductor processing.