The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 08, 2008

Filed:

May. 24, 2005
Applicants:

Chien-teh Kao, Sunnyvale, CA (US);

Jing-pei (Connie) Chou, Sunnyvale, CA (US);

Chiukin (Steven) Lai, Sunnyvale, CA (US);

Sal Umotoy, Antioch, CA (US);

Joel M. Huston, San Jose, CA (US);

Son Trinh, Cupertino, CA (US);

Mei Chang, Saragoga, CA (US);

Xiaoxiong (John) Yuan, Cupertino, CA (US);

Yu Chang, San Jose, CA (US);

Xinliang LU, Sunnyvale, CA (US);

Wei W. Wang, Cupertino, CA (US);

See-eng Phan, San Jose, CA (US);

Inventors:

Chien-Teh Kao, Sunnyvale, CA (US);

Jing-Pei (Connie) Chou, Sunnyvale, CA (US);

Chiukin (Steven) Lai, Sunnyvale, CA (US);

Sal Umotoy, Antioch, CA (US);

Joel M. Huston, San Jose, CA (US);

Son Trinh, Cupertino, CA (US);

Mei Chang, Saragoga, CA (US);

Xiaoxiong (John) Yuan, Cupertino, CA (US);

Yu Chang, San Jose, CA (US);

Xinliang Lu, Sunnyvale, CA (US);

Wei W. Wang, Cupertino, CA (US);

See-Eng Phan, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/461 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for removing native oxides from a substrate surface is provided. In at least one embodiment, the method includes supporting the substrate surface in a vacuum chamber and generating reactive species from a gas mixture within the chamber. The substrate surface is then cooled within the chamber and the reactive species are directed to the cooled substrate surface to react with the native oxides thereon and form a film on the substrate surface. The substrate surface is then heated within the chamber to vaporize the film.


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