Jing-Pei (Connie) Chou

Title: Innovations by Jing-Pei (Connie) Chou

Introduction

Jing-Pei (Connie) Chou is an accomplished inventor based in Sunnyvale, CA (US). She has made significant contributions to the field of semiconductor processing, holding a total of 4 patents. Her work focuses on methods for improving substrate surface treatments, which are crucial in various manufacturing processes.

Latest Patents

One of her latest patents is a method for removing native oxides from a substrate surface. This method involves positioning a substrate with an oxide layer into a processing chamber and exposing it to a gas mixture. The process forms a volatile film on the substrate while maintaining a temperature below 65° C. Afterward, the substrate is heated to at least 75° C. to sublimate the volatile film and effectively remove the oxide layer. Another notable patent is related to front end of line fabrication. This method supports a substrate containing silicon oxide within a processing chamber, generating a plasma of reactive species from a gas mixture. The substrate is cooled to a temperature below 65° C. and the reactive species are directed to react with the silicon oxide, forming a film that typically contains ammonium hexafluorosilicate.

Career Highlights

Jing-Pei (Connie) Chou is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. Her innovative approaches have contributed to advancements in substrate processing techniques, enhancing the efficiency and effectiveness of manufacturing processes.

Collaborations

Throughout her career, she has collaborated with notable colleagues, including Chien-Teh Kao and Chiukin (Steven) Lai. These collaborations have fostered a productive environment for innovation and development in their field.

Conclusion

Jing-Pei (Connie) Chou's contributions to semiconductor processing through her patents and work at Applied Materials, Inc. highlight her role as a significant innovator in the industry. Her methods for substrate treatment continue to influence advancements in manufacturing technologies.