Tokyo, Japan

Ryuichi Kosuge

This inventor holds 20 USPTO granted patents and 8 published patent applications, primarily in Polishing Technology. Top assignees: Ebara Corporation, Ckd Corporation. Active years: 2010-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ryuichi Kosuge. Retrieved from https://idiyas.com/inventor/ryuichi-kosuge

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20 

% Patents Active = 90.0

Average Co-Inventor Count = 3.3

ph-index = 5

Forward Citations = 52(Granted Patents)


Company Filing History:


Years Active: 2010-2026

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Areas of Expertise:
Substrate Processing
Polishing Apparatus
Liquid Supply
Chemical Mechanical Polishing
Dew Condensation
Polishing Method
Wear Detection
Rotary Joint
Polishing Surface
Polishing Device
Substrate Conveyance
Polishing Head Cover
20 patents (USPTO):Explore Patents

Title: Ryuichi Kosuge: Innovator in Polishing Technology

Introduction

Ryuichi Kosuge, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of polishing technology. With a remarkable portfolio of 19 patents, Kosuge’s innovations have advanced methods and apparatuses used in the polishing of substrates, demonstrating his expertise and forward-thinking approach in this specialized area.

Latest Patents

Ryuichi Kosuge's latest patents include a sophisticated polishing device, a polished method, and a recording medium for a program designed to determine the supply position of polishing liquid. This innovation features an operation control unit that aggregates data regarding the correlation between the supply position of the polishing liquid, the average polishing rate of the substrate, and the distribution of polishing rates across the substrate. The program is engineered to define the liquid injection nozzle's movements based on a predetermined allowable average polishing rate and the established correlations. Furthermore, it identifies the optimal supply position for polishing liquid, enhancing efficiency in substrate polishing.

Another notable patent is the polishing apparatus, which emphasizes increasing added value in its design. This apparatus integrates a polishing table that supports a polishing pad and a top ring to apply pressure to the substrate against the pad. Notably, it boasts a liquid supply mechanism that includes a movable nozzle arm and a fan-shaped liquid ejection nozzle designed for precision liquid application on the polishing pad.

Career Highlights

Throughout his career, Kosuge has vastly improved polishing techniques and tools, ensuring that his inventions are at the forefront of technological advancements in the industry. He has worked with renowned companies like Ebara Corporation and CKD Corporation, where he honed his skills and developed his innovative ideas.

Collaborations

In his professional journey, Ryuichi Kosuge has had the opportunity to collaborate with esteemed colleagues such as Tadakazu Sone and Masao Umemoto. Together, they have contributed to advancing polishing technologies and refining product designs, further enhancing the capabilities of the industries they serve.

Conclusion

Ryuichi Kosuge stands out as a pivotal figure in polishing innovation, with a noteworthy track record of patents that highlight his contributions to the field. His work not only reflects his inventive spirit but also underlines the importance of precision and efficiency in substrate polishing technology. As industries continue to evolve, Kosuge's inventions will likely play a vital role in shaping future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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