Hillsboro, OR, United States of America

Ryosuke Niitsuma


Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 489(Granted Patents)


Location History:

  • Miyagi, JP (2017 - 2020)
  • Hillsboro, OR (US) (2020)

Company Filing History:


Years Active: 2017-2020

where 'Filed Patents' based on already Granted Patents

8 patents (USPTO):

Title: Celebrating the Innovations of Ryosuke Niitsuma: A Pioneer in Plasma Processing Technologies

Introduction: Ryosuke Niitsuma, an innovative inventor based in Hillsboro, OR, has made significant contributions to the field of plasma processing technologies. With a remarkable portfolio of 8 patents, Niitsuma's work focuses on enhancing methods and apparatuses for plasma processing, which have wide applications in various industries, particularly in semiconductor manufacturing.

Latest Patents: Niitsuma's latest inventions, titled "Plasma Processing Method" and "Plasma Processing Apparatus", reflect his ingenuity in developing advanced manufacturing techniques. In his plasma processing method, he describes the formation of a carbon-containing film on chamber components using plasma derived from a carbon-containing gas. Following this, a silicon-containing film is deposited, with thickness determined by the carbon film. The process continues with loading a target object into the chamber for further plasma processing. After completion, both the silicon and carbon films are effectively removed using plasmas from fluorine- and oxygen-containing gases, respectively. Another noteworthy method involves processing a target object featuring an etching target layer, alongside an organic film and mask. This innovative approach includes etching, conformally forming a protective film, and further plasma treatments for mask removal.

Career Highlights: Ryosuke Niitsuma is an integral part of Tokyo Electron Limited, where his expertise in plasma processing technologies has propelled advancements in semiconductor fabrication. His innovative mindset and hands-on experience in the field make him a valuable contributor to the company's research and development efforts.

Collaborations: Throughout his career, Niitsuma has collaborated with talented colleagues, including Shinya Morikita and Shinichi Kozuka. These collaborations have allowed for the exchange of ideas and insights, further driving innovations in their field.

Conclusion: Ryosuke Niitsuma stands out as a prominent inventor whose work in plasma processing demonstrates a strong commitment to technological advancement. His patents reflect a deep understanding of materials science and engineering principles, enhancing manufacturing efficiency and precision within the semiconductor industry. As he continues to explore new frontiers, Niitsuma's contributions will undoubtedly have a lasting impact on future innovations.

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