The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 2017
Filed:
Oct. 23, 2014
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Masaru Nishino, Miyagi, JP;
Takao Funakubo, Miyagi, JP;
Shinichi Kozuka, Miyagi, JP;
Ryosuke Niitsuma, Miyagi, JP;
Tsutomu Ito, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/3065 (2006.01); H01J 37/32 (2006.01); C23C 16/44 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31116 (2013.01); C23C 16/4405 (2013.01); H01J 37/32477 (2013.01); H01J 37/32862 (2013.01); H01L 21/3065 (2013.01);
Abstract
A metal-containing deposit can be efficiently removed. A plasma processing method includes removing a deposit, which adheres to a member within a processing vessel and contains at least one of a transition metal and a base metal, by plasma of a processing gas containing a CxFy gas, in which x is an integer equal to or less than 2 and y is an integer equal to or less than 6, and without containing a chlorine-based gas and a nitrogen-based gas.