The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2018
Filed:
Dec. 04, 2015
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Ryosuke Niitsuma, Miyagi, JP;
Haruto Kanamori, Miyagi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01); C03C 15/00 (2006.01); C03C 25/68 (2006.01); C23F 1/00 (2006.01); B44C 1/22 (2006.01); H01L 21/311 (2006.01); H01J 37/32 (2006.01); H01L 21/3065 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31116 (2013.01); H01J 37/32027 (2013.01); H01J 37/32467 (2013.01); H01L 21/3065 (2013.01); H01L 21/31138 (2013.01); H01L 21/32136 (2013.01); H01L 21/32137 (2013.01); H01L 21/32139 (2013.01);
Abstract
A plasma processing method uses a plasma processing apparatus including a processing chamber, a mounting table provided in the processing chamber and configured to support a target object, and a ceiling member made of silicon and provided above the mounting table. The plasma processing method includes loading the target object into the processing chamber and generating a plasma of a processing gas containing chlorine gas and oxygen gas in the processing chamber.