Itami, Japan

Ryo Hattori


 

Average Co-Inventor Count = 2.1

ph-index = 12

Forward Citations = 363(Granted Patents)


Location History:

  • Itami, JP (1989 - 1999)
  • Fukuoka, JP (2013)
  • Tokyo, JP (1998 - 2019)

Company Filing History:


Years Active: 1989-2019

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32 patents (USPTO):Explore Patents

Title: The Ingenious Contributions of Ryo Hattori in Silicon Carbide Technology

Introduction

Ryo Hattori is a prominent inventor based in Itami, Japan, known for his remarkable contributions to the field of semiconductor technology. With a total of 32 patents to his name, Hattori has established himself as a leading figure in the manufacturing of silicon carbide epitaxial layers, significantly advancing the efficiency and precision in this area.

Latest Patents

Among his latest innovations, Hattori has developed a patent for a method of manufacturing silicon carbide epitaxial wafers. This invention addresses the critical need for precision by allowing multiple silicon carbide epitaxial layers of predetermined thickness to be formed accurately. The process involves creating a first n-type SiC epitaxial layer on an n-type SiC substrate with a required rate of change in impurity concentration, and then layering a second n-type SiC epitaxial layer with a similar concentration gradient.

Additionally, Hattori has patented a film thickness measurement method, which employs Fourier transform infrared spectroscopy to analyze reflection interference in semiconductor substrates. This method optimizes the measurement of the thickness of epitaxial layers, ensuring minimal distortion and high reliability in measurements.

Career Highlights

Throughout his career, Ryo Hattori has worked with notable companies, including Mitsubishi Denki Kabushiki Kaisha and Mitsubishi Electric Corporation. His work in these organizations has allowed him to hone his expertise and contribute significantly to advancements in semiconductor technology.

Collaborations

Hattori has collaborated with esteemed colleagues including Shigeru Mitsui and Tomoki Oku. These partnerships have further fueled innovation and development within the semiconductor sector, allowing for the exchange of ideas and technologies that propel their research and applications forward.

Conclusion

Ryo Hattori’s inventive spirit and commitment to advancing semiconductor technology make him a vital contributor in the field. His patents not only showcase his technical proficiency but also illustrate the impact that innovative thinkers have on the industry. As he continues to push the boundaries of what is possible in silicon carbide manufacturing, Hattori remains an influential figure, inspiring future inventors to develop groundbreaking solutions.

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