The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 1998
Filed:
Feb. 01, 1996
Ryo Hattori, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A method for fabricating a semiconductor device includes: successively laminating a pair or more pairs of Ti and Al thin films on an n type GaAs substrate thereby to form Ti/Al laminated films; and performing thermal processing to the n type GaAs substrate and the Ti/Al laminated films at a temperature lower than the temperature at which Al of the Ti/Al laminated films and GaAs of the n type GaAs layer react with each other, to make the Ti/Al laminated films have ohmic junction with the n type GaAs layer thereby to form an ohmic electrode. Therefore, the Ti/Al laminated layer film comprising materials which are not likely to intrude into the n type GaAs layer is alloyed to Al.sub.3 Ti alloy by the annealing, and during the annealing, Ga atoms are out-migrated from the n type GaAs layer, and the Si atoms as dopants in the n type GaAs layer are present in the junction interface of the n type GaAs layer with the Ti/Al laminated layer film, thereby to form an ohmic contact. Thereby, a semiconductor device provided with ohmic electrodes having heat-resistant property and shallow junction surfaces is obtained.