Chandler, AZ, United States of America

Roy Dittler

USPTO Granted Patents = 6 

Average Co-Inventor Count = 6.6

ph-index = 1


Company Filing History:


Years Active: 2020-2025

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6 patents (USPTO):

Title: Roy Dittler: Innovator in Electroless Plating and Electronic Substrates

Introduction

Roy Dittler is a prominent inventor based in Chandler, AZ (US). He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work primarily focuses on electroless plating processes and electronic substrates, showcasing his expertise in innovative manufacturing techniques.

Latest Patents

Dittler's latest patents include an electroless plating process that utilizes a panel basket for holding semiconductor panels. This process is designed to shield metal pads from contaminants, thereby preventing over-etching and under-etching. Another notable patent involves the fabrication of electronic substrates with embedded inductors. This invention features a base substrate with an inductor that includes a magnetic material layer and a barrier layer, which prevents the magnetic material from leaching into plating solutions during fabrication. The barrier layer can be made from various materials, including titanium, polymeric substances, or nitride materials.

Career Highlights

Roy Dittler is currently employed at Intel Corporation, where he continues to push the boundaries of technology through his innovative work. His contributions have been instrumental in advancing semiconductor manufacturing processes, making him a valuable asset to his team and the industry.

Collaborations

Dittler has collaborated with notable colleagues such as Darko Grujicicic and Rengarajan Shanmugam, further enhancing the impact of his work in the field.

Conclusion

Roy Dittler's innovative patents and contributions to semiconductor technology highlight his role as a leading inventor in the industry. His work continues to influence advancements in electroless plating and electronic substrates, solidifying his legacy as a significant figure in the field.

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