The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2022
Filed:
Sep. 22, 2017
Intel Corporation, Santa Clara, CA (US);
Darko Grujicic, Chandler, AZ (US);
Rengarajan Shanmugam, Chandler, AZ (US);
Sandeep Gaan, Phoenix, AZ (US);
Adrian Bayraktaroglu, Chandler, AZ (US);
Roy Dittler, Chandler, AZ (US);
Ke Liu, Chandler, AZ (US);
Suddhasattwa Nad, Chandler, AZ (US);
Marcel A. Wall, Chandler, AZ (US);
Rahul N. Manepalli, Chandler, AZ (US);
Ravindra V. Tanikella, Chandler, AZ (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Embodiments of the present disclosure describe techniques for providing an apparatus with a substrate provided with plasma treatment. In some instances, the apparatus may include a substrate with a surface that comprises a metal layer to provide signal routing in the apparatus. The metal layer may be provided in response to a plasma treatment of the surface with a functional group containing a gas (e.g., nitrogen-based gas), to provide absorption of a transition metal catalyst into the surface, and subsequent electroless plating of the surface with a metal. The transition metal catalyst is to enhance electroless plating of the surface with the metal. Other embodiments may be described and/or claimed.