Phoenix, AZ, United States of America

Ravindra V Tanikella

This inventor holds 13 USPTO granted patents. Top assignee: Intel Corporation. Active years: 2008-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ravindra V Tanikella. Retrieved from https://idiyas.com/inventor/ravindra-v-tanikella

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 30.8

Average Co-Inventor Count = 1.6

ph-index = 2

Forward Citations = 29(Granted Patents)


Location History:

  • Phoneix, AZ (US) (2009)
  • Phoenix, AZ (US) (2008 - 2014)
  • Chanler, AZ (US) (2016)
  • Chandler, AZ (US) (2015 - 2022)

Company Filing History:


Years Active: 2008-2022

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13 patents (USPTO):Explore Patents

Title: Ravindra V Tanikella: Innovator in Semiconductor Technology

Introduction

Ravindra V Tanikella is a prominent inventor based in Phoenix, AZ, known for his significant contributions to semiconductor technology. With a total of 13 patents to his name, he has made remarkable advancements in the field, particularly in the areas of plasma treatment and microelectronic packaging.

Latest Patents

Among his latest patents is an "Apparatus with a substrate provided with plasma treatment." This invention describes techniques for creating an apparatus that includes a substrate with a metal layer, which is essential for signal routing. The metal layer is achieved through plasma treatment using a functional group containing a gas, such as nitrogen-based gas. This process enhances the absorption of a transition metal catalyst into the substrate, facilitating electroless plating with metal.

Another notable patent is the "Semiconductor device having polyimide layer." This invention focuses on achieving highly reliable interconnections for microelectronic packaging. It involves dielectric layers with varying glass transition temperatures, allowing for effective lamination of later applied dielectric layers at lower temperatures. The use of polyimide material with embedded catalysts promotes cross-linking, ensuring robust interconnections.

Career Highlights

Ravindra V Tanikella is currently employed at Intel Corporation, where he continues to innovate and develop cutting-edge technologies. His work has significantly impacted the semiconductor industry, enhancing the reliability and efficiency of microelectronic devices.

Collaborations

Throughout his career, Tanikella has collaborated with talented individuals such as Nachiket R Raravikar and Mengzhi Pang. These collaborations have fostered a creative environment that has led to groundbreaking advancements in semiconductor technology.

Conclusion

Ravindra V Tanikella's contributions to the field of semiconductor technology are noteworthy, with a strong portfolio of patents that reflect his innovative spirit. His work at Intel Corporation continues to push the boundaries of what is possible in microelectronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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