Shanghai, China

Roger Lee

USPTO Granted Patents = 20 

Average Co-Inventor Count = 3.2

ph-index = 4

Forward Citations = 77(Granted Patents)


Location History:

  • Eagle, ID (US) (2010 - 2015)
  • Shanghai, CN (2005 - 2021)

Company Filing History:


Years Active: 2005-2021

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20 patents (USPTO):

Title: The Innovative Mind of Roger Lee: Pioneering Semiconductor Technologies in Shanghai

Introduction: Roger Lee, an esteemed inventor located in Shanghai, China, holds a remarkable portfolio of 20 patents. His contributions to the field of semiconductor technology highlight his commitment to innovation and advancement. Lee’s latest invention focuses on enhancing FinFET (Fin Field-Effect Transistor) devices, a vital aspect of modern electronics.

Latest Patents: One of Roger Lee’s most recent patents is centered on hybrid integrated semiconductor tri-gate and split dual-gate FinFET devices and the method for their manufacturing. This invention describes a sophisticated method for creating tri-gate and dual-gate FinFETs by utilizing a semiconductor on insulator (SOI) wafer. The process involves several critical steps, including the formation of a hard mask on the semiconductor layer, etching to create fins, and the development of gate structures, culminating in the planarization of the interlayer dielectric layer. This innovative method promises to streamline the manufacturing process for more efficient and effective semiconductor devices.

Career Highlights: Roger Lee has had a profound impact during his professional journey, particularly with his work at Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His roles in these esteemed organizations allowed him to collaborate on groundbreaking projects that have significantly influenced the semiconductor landscape.

Collaborations: Throughout his career, has worked alongside notable colleagues, including De Yuan Xiao and Guo Qing Chen. These collaborations have contributed to the innovation and success of various semiconductor technologies, showcasing Lee’s ability to work effectively within a team of talented professionals.

Conclusion: Roger Lee stands as a prominent figure in the realm of semiconductor innovation, with numerous patents reflecting his inventive spirit and technical prowess. His latest work on FinFET technology not only underscores his creativity but also his commitment to advancing the field of electronics. Lee’s contributions continue to pave the way for future advancements, making him a key player in the global semiconductor industry.

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