Saratoga, CA, United States of America

Robert Parkash Mandal


Average Co-Inventor Count = 2.2

ph-index = 21

Forward Citations = 1,751(Granted Patents)


Company Filing History:


Years Active: 1976-2010

where 'Filed Patents' based on already Granted Patents

41 patents (USPTO):

Title: Innovator Spotlight: Robert Parkash Mandal - Pioneering Very Low Dielectric Constant Films.

Introduction:

Robert Parkash Mandal, a prolific inventor hailing from Saratoga, CA, has made significant contributions to the field of materials science and technology. With an impressive track record of 41 patents to his name, Mandal's groundbreaking work in nano-porous low dielectric constant films has garnered widespread recognition in the industry.

Latest Patents:

Mandal's latest patents revolve around the development of very low dielectric constant plasma-enhanced CVD films. These innovative films are produced by reacting oxidizable silicon-containing compounds with sources of reactive oxygen in gas-phase plasma-enhanced reactions. The resulting nano-porous silicon oxide-based films exhibit a low-density structure with dispersed microscopic voids, making them ideal for applications such as forming layers between metal lines and as intermetal dielectric layers for dual damascene structures.

Career Highlights:

Throughout his career, Mandal has been associated with renowned companies such as Applied Materials, Inc. and ASML Holding N.V. His expertise and dedication to advancing nanotechnology and semiconductor manufacturing have positioned him as a leading figure in the industry. Mandal's passion for innovation and problem-solving is evident in the numerous patents he has been granted over the years.

Collaborations:

In his professional journey, Mandal has collaborated with esteemed colleagues, including David Wingto Cheung and Wai-Fan Yau. Together, they have pushed the boundaries of materials science and paved the way for cutting-edge technologies in the semiconductor industry. Their collaborative efforts have resulted in the development of novel solutions that have had a lasting impact on the field.

Conclusion:

Robert Parkash Mandal's innovative work in the realm of very low dielectric constant films exemplifies his ingenuity and dedication to advancing technology. His numerous patents and contributions to the industry underscore his position as a trailblazer in the field of materials science. Mandal's pioneering spirit and collaborative mindset continue to inspire innovation and drive progress in the ever-evolving landscape of nanotechnology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…