Santa Cruz, CA, United States of America

Robert J Bailey


Average Co-Inventor Count = 2.2

ph-index = 6

Forward Citations = 123(Granted Patents)


Location History:

  • Santa Cruz, CA (US) (1999 - 2004)
  • Winsted, CT (US) (2006)

Company Filing History:


Years Active: 1999-2006

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7 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Robert J. Bailey in Wafer Processing Technologies**

Introduction

Robert J. Bailey, based in Santa Cruz, California, is a notable inventor recognized for his significant contributions in the field of wafer processing technologies. With six patents to his name, Bailey has continually pushed the boundaries of innovation in chemical vapor deposition and pressure control systems, specifically aimed at improving the efficiency and stability of semiconductor manufacturing processes.

Latest Patents

One of Bailey's latest patents, titled "Atmospheric Pressure Wafer Processing Reactor Having an Internal Pressure Control System and Method," introduces a sophisticated atmospheric pressure wafer processing system. This system enhances the delivery of gases and features an exhaust control feedback system that utilizes sensors to precisely measure the pressures within the system. By maintaining the desired set pressures, it allows for consistent processing of wafers, less sensitive to external environmental changes. This innovation is particularly beneficial for chemical vapor deposition applications, leading to improved process repeatability over extended runtime.

Another significant patent is the "Chemical Vapor Deposition System," designed for processing substrates with advanced features. The system comprises a heated muffle and a chamber equipped with an injector assembly for introducing chemical vapor. Notably, the belt used for substrate movement is coated with oxidation-resistant material, effectively minimizing deposit formation, especially chromium oxides. These coatings enhance the longevity and effectiveness of the processing equipment.

Career Highlights

Bailey's career includes valuable experience at several prominent technology companies. He has worked at Silicon Valley Group, Thermal Systems LLP, and WJ Semiconductor Equipment Group, Inc. His roles at these organizations have involved extensive research and development, allowing him to translate theoretical concepts into practical innovations that advance technology in the semiconductor field.

Collaborations

Throughout his career, Robert J. Bailey has collaborated with numerous individuals, including notable colleagues like Lawrence Duane Bartholomew and Lisa H. Michael. These partnerships have contributed to the exchange of ideas and collaborative problem-solving in developing cutting-edge technologies.

Conclusion

Robert J. Bailey stands out as an impactful inventor within the semiconductor industry, significantly through his patented innovations. His latest works in atmospheric pressure wafer processing and chemical vapor deposition highlight his commitment to refining technological processes that enhance efficiency and effectiveness. As technology continues to evolve, the contributions of innovators like Bailey will remain instrumental in shaping the future of semiconductor manufacturing.

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