Robert Hölzl

Title: The Innovations of Robert Hölzl

Introduction

Robert Hölzl is a notable inventor based in Postmünster, Germany. He has made significant contributions to the field of silicon wafer technology, holding two patents that showcase his expertise and innovative spirit. His work has implications for various applications in the semiconductor industry.

Latest Patents

Hölzl's latest patents include a process for producing a single-crystal silicon wafer. This process involves specific steps to ensure the quality of the silicon wafer, including exposure to an oxygen-containing atmosphere during heat treatment. Another significant patent is for an SOI (Silicon On Insulator) wafer, which features a substrate made from silicon and an electrically insulating layer. This wafer is designed to have precise thermal conductivity and minimal defects, making it suitable for advanced electronic applications.

Career Highlights

Robert Hölzl is associated with Siltronic AG, a leading company in the production of silicon wafers. His work at Siltronic AG has positioned him as a key player in the development of innovative silicon technologies. His patents reflect his commitment to advancing the semiconductor industry through improved materials and processes.

Collaborations

Hölzl has collaborated with notable colleagues, including Reinhold Wahlich and Dirk Dantz. These partnerships have likely contributed to the successful development of his patented technologies.

Conclusion

Robert Hölzl's contributions to silicon wafer technology through his patents demonstrate his innovative capabilities and commitment to advancing the semiconductor industry. His work continues to influence the field and inspire future innovations.