Rie Inazawa, Legal Representative

Title: Rie Inazawa - Innovator in Plasma Processing Technologies

Introduction

Rie Inazawa is a prominent legal representative and inventor based in Yamanashi-ken, Japan. She has made significant contributions to the field of plasma processing technologies, particularly in the semiconductor industry. With a total of 4 patents to her name, Inazawa has developed innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Inazawa's latest patents include a method for low-pressure removal of photoresist and etch residue. This method utilizes a two-step plasma process involving an oxygen-containing gas, which effectively removes photoresist remnants and etch residues formed during plasma etching of dielectric layers. The first cleaning step applies low or zero bias to the substrate, while the second step increases the bias to ensure thorough removal of residues. This innovative approach reduces the memory effect commonly observed in conventional one-step ashing processes.

Another notable patent is her etching method, which involves etching a lower layer film of an organic material using an upper layer film of an Si-containing organic material as a mask. By supplying a mixed gas containing NH3 and O2 into the processing vessel, Inazawa's method allows for precise control of the etching process, achieving satisfactory CD shift values by adjusting the flow ratio of the gases.

Career Highlights

Throughout her career, Rie Inazawa has worked with leading companies in the semiconductor industry, including Tokyo Electron Limited and Toshiba Corporation. Her expertise in plasma processing has made her a valuable asset in these organizations, where she has contributed to the development of advanced manufacturing techniques.

Collaborations

Inazawa has collaborated with notable professionals in her field, including Vaidyanathan Balasubramaniam and Masaaki Hagihara. These collaborations have further enriched her work and contributed to the advancement of plasma processing technologies.

Conclusion

Rie Inazawa's innovative contributions to plasma processing technologies have significantly impacted the semiconductor industry. Her patents reflect her commitment to improving manufacturing processes and her expertise in the field. Inazawa continues to be a leading figure in the development of advanced semiconductor technologies.