Richard F Reichelderfer

Title: **Richard F. Reichelderfer: Innovating Etching Processes in the Semiconductor Industry**

Introduction

Richard F. Reichelderfer, based in Castro Valley, California, is a notable inventor recognized for his significant contributions to the field of semiconductor manufacturing. With a total of five patents, his work has greatly enhanced etching processes, making them more efficient and effective in planar reactors.

Latest Patents

Reichelderfer's most recent patents include innovative processes for etching aluminum and silicon-based materials. One of his key inventions is a "Process and gas mixture for etching aluminum in a plasma environment in a planar reactor." This invention involves a gas mixture that comprises a primary etching gas and a secondary gas, which controls the anisotropic character of the etch. By generating a stable, uniform plasma at relatively high pressure and power levels, this process enables substantially faster removal of aluminum compared to previous methods.

Another significant patent is the "Process and gas mixture for etching silicon dioxide and silicon nitride in a plasma environment in a planar reactor." This invention also features a unique gas mixture that enhances selectivity in etching silicon dioxide and/or silicon nitride. Executed at high pressure and power levels, this process remarkably accelerates the removal rates of these materials, representing a major advancement in the field.

Career Highlights

Throughout his career, Reichelderfer has worked with prominent companies such as Branson International Plasma Corporation and Dionex Corporation. His roles at these institutions have allowed him to apply his innovative ideas in practical settings, further influencing the semiconductor industry.

Collaborations

Reichelderfer has benefited from collaborations with esteemed coworkers, including Diane C. Vogel and Marian C. Tang. Their combined expertise and focus on advanced technologies have fostered a creative environment for developing cutting-edge etching processes.

Conclusion

Richard F. Reichelderfer's work represents a significant stride in the evolution of semiconductor manufacturing processes. With five patents to his name, his innovations in etching processes for aluminum and silicon-based materials continue to shape the industry's standards and practices, ultimately contributing to the advancement of modern technology.