The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 1979
Filed:
Mar. 04, 1977
Applicant:
Inventors:
James F Battey, Los Altos, CA (US);
Richard L Bersin, San Lorenzo, CA (US);
Richard F Reichelderfer, Castro Valley, CA (US);
Joseph M Welty, Fremont, CA (US);
Assignee:
Dionex Corporation, Hayward, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23F / ;
U.S. Cl.
CPC ...
2041 / ; 156643 ; 156665 ; 204298 ; 250531 ;
Abstract
Process and apparatus for carrying out a reaction, such as etching aluminum, in the glow discharge of a gas plasma. The plasma is formed between a pair of closely spaced electrodes, and a distributed impedance is provided in series with the plasma to assure uniform distribution of the ionizing current and the glow discharge of the plasma throughout the region between the electrodes.