Company Filing History:
Years Active: 1978-1979
Title: The Innovations of Richard L. Bersin
Introduction
Richard L. Bersin is a notable inventor based in San Lorenzo, CA (US). He has made significant contributions to the field of plasma technology and etching processes. With a total of 2 patents, his work has advanced the understanding and application of gas plasma reactors.
Latest Patents
Bersin's latest patents include a gas plasma reactor and process, which involves a method and apparatus for conducting reactions, such as etching aluminum, within the glow discharge of a gas plasma. This innovative process utilizes closely spaced electrodes to form the plasma, ensuring a uniform distribution of ionizing current and glow discharge throughout the region between the electrodes. Another significant patent is for a process for etching SiO₂ using hydrogen fluoride gas, which employs an organic material like negative photoresist as a catalyst. This method allows for precise etching of SiO₂, with variations in the application of photoresist to optimize the etching process.
Career Highlights
Richard L. Bersin is currently associated with Dionex Corporation, where he continues to develop and refine his innovative technologies. His work has been instrumental in enhancing the efficiency and effectiveness of plasma-based processes in various applications.
Collaborations
Bersin has collaborated with notable colleagues, including Richard F. Reichelderfer and James F. Battey, contributing to a dynamic environment of innovation and research.
Conclusion
Richard L. Bersin's contributions to the field of plasma technology and etching processes highlight his role as a significant inventor. His patents reflect a commitment to advancing technology and improving industrial processes.