Baoshan, China

Ren-Guey Hsieh


Average Co-Inventor Count = 1.7

ph-index = 2

Forward Citations = 218(Granted Patents)


Location History:

  • Ping-Tung, TW (2001 - 2006)
  • Baoshan Township, Hsinchu County, TW (2012)
  • Baoshan Township, TW (2014)

Company Filing History:


Years Active: 2001-2014

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7 patents (USPTO):Explore Patents

Title: Ren-Guey Hsieh: Innovator in Photomask Technology

Introduction

Ren-Guey Hsieh is a prominent inventor based in Baoshan, China, known for his significant contributions to the field of photomask technology. With a total of seven patents to his name, he has made notable advancements that enhance manufacturing processes in semiconductor fabrication.

Latest Patents

His latest patents include innovative designs that address the challenges of light scattering in photomasks. The first patent describes a photomask and photomask substrate with reduced light scattering properties. This technology incorporates a substantially light transparent substrate featuring a circuitry pattern, which includes a phase-shifting layer and a light shielding layer.

The second patent details a method for forming a robust mask that includes various layers for improved functionality. This innovative process involves photolithographic patterning, forming a shielding layer, and utilizing a resist layer to produce an effective circuitry pattern, thereby enhancing the efficiency and performance of semiconductor devices.

Career Highlights

Ren-Guey Hsieh works at Taiwan Semiconductor Manufacturing Company Ltd., a leading institution in the semiconductor industry. His expertise in photomask technology plays a critical role in the development of advanced manufacturing techniques that are essential for producing cutting-edge semiconductor products.

Collaborations

Throughout his career, Hsieh has collaborated with notable colleagues such as Chang-Cheng Hung and Ken Wu. These partnerships have facilitated the exchange of ideas and innovations, leading to groundbreaking advancements in the field.

Conclusion

Ren-Guey Hsieh's contributions to photomask technology exemplify the impact of innovative thinking in the semiconductor industry. His patents not only reflect his expertise but also his commitment to advancing manufacturing technologies that propel the industry forward. As he continues to develop new methods and designs, Hsieh's work will undoubtedly leave a lasting legacy in the world of electronics and technology.

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