HSINCHU, Taiwan

Ren-guan Duan

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Ren-guan Duan: Innovator in Fluorine-containing Elastomers and ALD Coatings

Introduction

Ren-guan Duan is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of fluorine-containing elastomers and advanced atomic layer deposition (ALD) coatings. With a total of 2 patents, his work has implications for various industrial applications.

Latest Patents

Duan's latest patents include a "Fluorine-containing elastomer composition and method for making cured fluorine-containing elastomer composition." This invention features a curable fluorine-containing polymer that incorporates a fluorinated cure site monomer and a group IIIB element-containing reinforcing additive. The composition is designed to enhance the performance of elastomers in various applications.

Another significant patent is the "Multilayer ALD coating for critical components in process chamber." This method involves forming multiple coatings on a surface using a series of atomic layer deposition processes. The innovative approach allows for the creation of both amorphous and crystalline rare earth metal oxides, enhancing the durability and functionality of critical components in process chambers.

Career Highlights

Ren-guan Duan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in materials science to advance semiconductor technologies. His work has been instrumental in improving the performance and reliability of semiconductor devices.

Collaborations

Duan has collaborated with esteemed colleagues such as Chung-Ming Huang and Chen-Hsiang Lu. These partnerships have fostered innovation and contributed to the successful development of his patented technologies.

Conclusion

Ren-guan Duan is a prominent inventor whose work in fluorine-containing elastomers and ALD coatings has made a significant impact in the field of materials science. His contributions continue to influence advancements in semiconductor technology and related industries.

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