Company Filing History:
Years Active: 2015-2018
Title: Remi Riviere: Innovator in Photolithography Technologies
Introduction
Remi Riviere is a notable inventor based in Dresden, Germany. She has made significant contributions to the field of photolithography, particularly in the development of methods and apparatuses that enhance the efficiency and effectiveness of photomask technologies. With a total of 3 patents to her name, Riviere continues to push the boundaries of innovation in her field.
Latest Patents
One of her latest patents is focused on in-situ contactless monitoring of photomask pellicle degradation. This invention provides a method and apparatus for detecting changes in the vibrational mode spectra and elasticity of a pellicle without relying on visual inspection. The process involves directing light from a source onto the pellicle, causing deflection, and detecting the reflected light to characterize the vibrational mode of the pellicle.
Another significant patent addresses methods, apparatus, and systems for minimizing defectivity in top-coat-free lithography. This invention aims to improve reticle CD uniformity by forming a photomask that includes both a main functional pattern and a sub-resolution fill pattern. The fill pattern is designed to not substantially modify the imaging of any structure of the main functional pattern during lithographic exposure.
Career Highlights
Remi Riviere is currently employed at Globalfoundries Inc., where she applies her expertise in photolithography to advance the company's technological capabilities. Her work has been instrumental in developing innovative solutions that address critical challenges in the semiconductor manufacturing process.
Collaborations
Throughout her career, Riviere has collaborated with esteemed colleagues such as Arthur Hotzel and Joachim Patzer. These collaborations have fostered an environment of innovation and have contributed to the successful development of her patented technologies.
Conclusion
Remi Riviere stands out as a pioneering inventor in the field of photolithography, with her innovative patents and contributions to Globalfoundries Inc. Her work continues to influence the industry and drive advancements in semiconductor technology.
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