Tokyo, Japan

Rei Kiumi


Average Co-Inventor Count = 5.4

ph-index = 3

Forward Citations = 40(Granted Patents)


Company Filing History:


Years Active: 2006-2012

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4 patents (USPTO):Explore Patents

Title: Rei Kiumi: Innovator in Plating Technology

Introduction

Rei Kiumi is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of plating technology, holding a total of 4 patents. Her innovative work focuses on enhancing the efficiency and effectiveness of plating processes, particularly in semiconductor applications.

Latest Patents

Kiumi's latest patents include a plating method and apparatus designed to improve the plating process on substrates. The first patent describes a plating apparatus that features a steam treatment chamber, which performs steam treatment on the substrate's surface. This is followed by a plating chamber that plates the treated surface. Additionally, the apparatus includes an acid treatment chamber that contacts the substrate with an acid liquid, all housed within a robust frame.

Another notable patent is a plating apparatus specifically for forming plated films in trenches, via holes, or resist openings on semiconductor wafers. This apparatus is equipped with a plating tank for holding the plating solution and a holder that brings the workpiece into contact with the solution. A ring-shaped nozzle pipe with multiple injection nozzles ensures an even supply of plating solution to the workpiece.

Career Highlights

Rei Kiumi is currently employed at Ebara Corporation, where she continues to develop innovative solutions in plating technology. Her work has significantly impacted the semiconductor industry, providing advanced methods for creating reliable and efficient electronic components.

Collaborations

Kiumi collaborates with esteemed colleagues, including Fumio Kuriyama and Nobutoshi Saito. Their combined expertise fosters a creative environment that drives innovation in their projects.

Conclusion

Rei Kiumi's contributions to plating technology exemplify her dedication to innovation and excellence. Her patents reflect a deep understanding of the complexities involved in semiconductor manufacturing, positioning her as a key figure in the industry.

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