Company Filing History:
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Years Active: 1989-2017
Title: The Innovations of Raul V Tan
Introduction
Raul V Tan is a notable inventor based in San Jose, CA, with a focus on advanced technologies in the semiconductor industry. He holds a total of 4 patents, showcasing his contributions to the field of engineering and technology. His work primarily revolves around methods and apparatuses that enhance the measurement and analysis of semiconductor structures.
Latest Patents
One of his latest patents is titled "Apparatus and methods for measuring properties in a TSV structure using beam profile reflectometry." This patent discloses innovative methods and apparatus for measuring characteristics of a through-silicon via (TSV) structure. The invention utilizes a beam profile reflectivity (BPR) tool to obtain optimum focus and reflectivity measurements at various angles of incidence, allowing for precise determination of film thicknesses and heights of TSV structures.
Another significant patent is the "Lithographic process analysis and control system." This system provides a modeled version of a lithographic process, focusing on feature width, focus, and exposure. It enables quick determination of focus and exposure limits necessary for achieving desired feature widths, complemented by flexible graphic display capabilities for data representation.
Career Highlights
Throughout his career, Raul V Tan has worked with prominent companies such as Shipley Company LLC and General Signal Corporation. His experience in these organizations has contributed to his expertise in the semiconductor field and has allowed him to develop innovative solutions that address industry challenges.
Collaborations
Raul has collaborated with notable professionals in his field, including David W Myers and Robert G Ozarski. These collaborations have likely enriched his work and contributed to the development of his patents.
Conclusion
Raul V Tan's contributions to the semiconductor industry through his patents and career achievements highlight his role as an influential inventor. His innovative approaches to measuring and analyzing semiconductor structures continue to impact the field positively.