The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 1989
Filed:
Dec. 18, 1987
David W Myers, Livermore, CA (US);
Robert G Ozarski, Livermore, CA (US);
Thiloma I Perera, Sunnyvale, CA (US);
John F Schipper, Palo Alto, CA (US);
Raul V Tan, San Jose, CA (US);
Michael P Watts, Portola Valley, CA (US);
General Signal Corporation, Stamford, CT (US);
Abstract
Two methods of determination of the chemical changes induced in a film of material such as photoresist that has been exposed to electromagnetic radiation. Two methods use measurement of polarized light reflected by the film mounted on a substrate to determine a real refractive index or a complex refractive index of the film. Two other methods use measurement of polarized light by the film mounted on a (partly) transparent substrate to determine a real refractive index or a complex refractive index of the film.