Thiloma I Perera

Title: Thiloma I Perera: Innovator in Semiconductor Technology

Introduction

Thiloma I Perera is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to material characterization and evaluation.

Latest Patents

His latest patents include "Characterization of Semiconductor Resist Material During Processing," which outlines several methods for evaluating changes induced in a film of semiconductor resist material after the coat process and before or at the completion of the softbake process. This is achieved by monitoring the thickness and absorption of the resist material. Another patent, "Absorption Measurements of Materials," presents two methods for determining the chemical changes in a film of material, such as photoresist, that has been exposed to electromagnetic radiation. These methods utilize measurements of polarized light reflected by the film to ascertain the real or complex refractive index.

Career Highlights

Thiloma has worked with prominent companies, including Hoechst Celanese Corporation and General Signal Corporation. His experience in these organizations has contributed to his expertise in semiconductor materials and processes.

Collaborations

Throughout his career, Thiloma has collaborated with notable colleagues, including John F Schipper and David W Myers. Their combined efforts have further advanced the field of semiconductor technology.

Conclusion

Thiloma I Perera's work in semiconductor technology exemplifies innovation and dedication. His patents reflect a deep understanding of material science and its applications in the industry.