The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 1989
Filed:
Mar. 01, 1988
Applicant:
Inventors:
Michael P Watts, Portola Valley, CA (US);
Thiloma I Perera, Sunnyvale, CA (US);
David W Myers, Livermore, CA (US);
Robert G Ozarski, Livermore, CA (US);
John F Schipper, Palo Alto, CA (US);
Raul V Tan, San Jose, CA (US);
Assignee:
Hoechst Celanese, Sommerville, NJ (US);
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356 73 ; 356381 ; 356432 ; 356446 ;
Abstract
Several methods for evaluating certain changes induced in a film of semiconductor resist material after the coat process and before or at completion of the softbake process, by monitoring thickness of and absorption by a film of resist material.