The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 1989
Filed:
Oct. 20, 1987
Applicant:
Inventors:
Christopher P Ausschnitt, Cambridge, MA (US);
Edward A McFadden, Midford, MA (US);
Raul V Tan, San Jose, CA (US);
Assignee:
Shipley Company, Inc., Newton, MA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F / ; G21K / ; H01J / ;
U.S. Cl.
CPC ...
364491 ; 2503 / ; 2504922 ;
Abstract
A lithographic process analysis and control system which provides a modeled verison of a lithographic process in the dimensions of feature width, focus and exposure. This system uses the model to quickly determine the range of focus and exposure limits for obtaining the desired feature width. The system has flexible graphic display capability for displaying graphic representations of the data as measured and modeled.