San Marcos, CA, United States of America

Raphael A Dandl

This inventor holds 13 USPTO granted patents and 1 EPO patent. Top assignees: Applied Microwave Plasma Concepts, Inc., Tokyo Electron Limited, Asm Japan K.k.. Active years: 1987-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Raphael A Dandl. Retrieved from https://idiyas.com/inventor/raphael-a-dandl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 69.2


Average Co-Inventor Count = 1.3

ph-index = 8

Forward Citations = 235(Granted Patents)


Company Filing History:


Years Active: 1987-2005

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13 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Raphael A. Dandl

Introduction

Raphael A. Dandl is a notable inventor based in San Marcos, CA, with a remarkable portfolio of 13 patents. His work primarily focuses on advancements in plasma technology, showcasing his expertise and innovative spirit in the field.

Latest Patents

Dandl's latest patents include the "Slow-wave induction plasma transport" and the "Stand alone plasma vacuum pump." The slow-wave induction plasma transport system utilizes a slow-wave power signal in external radio-frequency (RF) inductors to facilitate the flow of plasmas through ducts. This system creates a magneto-hydrodynamic force that displaces plasma electrons, resulting in a charge separation that drags ions along while slowing down the electrons. This innovative approach allows for a directed stream of energetic ions and neutral gas atoms, maintaining plasma charge neutrality. Additionally, the stand-alone plasma vacuum pump is designed to pump gas from a low-pressure inlet to a high-pressure outlet. It features a housing that encloses multiple pumping regions, permanent magnet assemblies for guiding plasmas, and elements for coupling microwave power to heat electrons and accelerate plasma ions.

Career Highlights

Throughout his career, Dandl has worked with various companies, including Applied Microwave Plasma Concepts, Inc. His contributions to the field of plasma technology have been significant, and his patents reflect his commitment to innovation and advancement in this area.

Collaborations

Dandl has collaborated with notable individuals such as Wayne L. Johnson and Gareth E. Guest, further enhancing his work and contributions to the field.

Conclusion

Raphael A. Dandl's innovative work in plasma technology and his impressive portfolio of patents highlight his significant contributions to the field. His inventions continue to pave the way for advancements in plasma applications and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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