The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 1991
Filed:
Jan. 04, 1989
Raphael A Dandl, San Marcos, CA (US);
Applied Microwave Plasma Concepts, Inc., Carlsbad, CA (US);
Abstract
A method and apparatus are disclosed for producing microwave radiation wherein a generally stable, high-beta, relativistic electron plasma is formed in a static magnetic field of a suitable enclosure either by an external microwave source or in situ within the plasma by means of at least one pair of steady-state interacting energetic electron beams, a convectively unstable wave then being created in the confined plasma either internally in an oscillator mode or externally in an amplifier mode by means of an external launcher for producing a pulse of relatively intense microwave radiation at a frequency near a local electron gyrofrequency. The above steps or functions are preferably sequentially repeated with sequential pulses of microwave radiation being withdrawn from the enclosure, focused by quasi-optical means and directed toward a target including electronic circuitry, so that the beam of sequential pulses is coupled into the electronic circuitry for developing substantial amounts of energy therein.