The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 1988
Filed:
Nov. 26, 1985
Raphael A Dandl, San Marcos, CA (US);
Applied Microwave Plasma Concepts, Inc., Carlsbad, CA (US);
Abstract
A method and apparatus are disclosed for producing microwave radiation wherein a generally stable, high-beta, relativistic electron plasma is formed and magnetically confined in a magnetic mirror region of a suitable enclosure, a convectively unstable wave then being created in the confined plasma for producing a pulse of relatively intense microwave radiation at a frequency near a local electron gyrofrequency of the plasma, the plasma preferably being formed by simultaneous multiple-frequency electron cyclotron heating and upper off-resonant heating using microwave power at frequencies above the electron gyrofrequency of the plasma. The above steps or functions are preferably sequentially repeated with sequential pulses of microwave radiation being withdrawn from the enclosure, focused by quasi-optical means and directed toward a target including electronic circuitry, the method and apparatus of the invention being preferably adapted for causing the beam of sequential pulses to be coupled into the electronic circuitry for developing substantial amounts of energy therein.