Boise, ID, United States of America

Randal W Chance

This inventor holds 20 USPTO granted patents and 2 EPO patents, primarily in Semiconductor Fabrication. Top assignee: Micron Technology Incorporated. Active years: 1990-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Randal W Chance. Retrieved from https://idiyas.com/inventor/randal-w-chance

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 90.0

 

Average Co-Inventor Count = 2.5

ph-index = 13

Forward Citations = 1,912(Granted Patents)


Company Filing History:


Years Active: 1990-2014

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Areas of Expertise:
Photolithography
Semiconductor Constructions
Mask Alignment
Imprint Lithography
MOSFET
DRAM Array
Phase Shifting Reticle
Static Discharge Circuit
Transistor Structure
Edge Connected Die
CMOS Process
Memory Device
20 patents (USPTO):Explore Patents

Title: The Innovative Mind of Randal W. Chance

Introduction

Randal W. Chance, a distinguished inventor based in Boise, ID, has made significant contributions to the field of integrated circuit technology. With a remarkable portfolio of 20 patents, his work focuses on enhancing alignment tolerances in mask patterns, which is crucial for the manufacturing process of integrated circuits.

Latest Patents

Randal's latest innovations include methods to align mask patterns that improve alignment tolerances between narrow and wider mask lines. The narrow mask lines, created through pitch multiplication, and the wider mask lines formed using photolithography, are precisely aligned. This innovative approach ensures that one side of the wider mask lines is either flush with or inset from the corresponding side of the narrow lines. The unique characteristic of the wider mask lines, which protrude on one side, contributes to increased alignment tolerances, allowing for a more efficient fabrication process of integrated circuits. By utilizing negative photoresist with a height less than that of the narrow mask lines, Randal's method substantially prevents expansion in one direction, thereby optimizing the alignment. Furthermore, the shadowing effect from the height difference helps form the wider mask lines with rounded corners, further enhancing alignment accuracy.

Career Highlights

Randal's career is marked by his role at Micron Technology Incorporated, where he has applied his expertise in semiconductor technology. His extensive experience in the field adds to his reputation as a leading inventor, driving forward innovations that impact the electronics industry.

Collaborations

In his endeavors, Randal has collaborated with talented colleagues such as Tyler A. Lowrey and Gurtej S. Sandhu. These partnerships have fostered a creative environment conducive to innovation, enabling the team to tackle complex challenges in integrated circuit design and manufacturing.

Conclusion

Randal W. Chance exemplifies the spirit of innovation through his extensive work in the field of integrated circuits. His inventions not only advance technology but also pave the way for future developments in the electronics industry. With a foundation of collaboration and creativity, Randal's contributions continue to resonate within the technical community.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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