Shanghai, China

Ran Huang

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2025

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: **Innovator Spotlight: Ran Huang from Shanghai**

Introduction

Ran Huang, an esteemed inventor based in Shanghai, China, has made significant contributions to the fields of materials testing and semiconductor processing. With a remarkable portfolio of four patents, his innovative approaches have pushed the boundaries of technology and engineering, particularly in healthcare applications and microelectronics.

Latest Patents

Ran Huang's latest patents showcase his ingenuity and commitment to advancing technology. One of his standout inventions is the **Multi-dimensional broad-spectrum clinical in-situ testing equipment for evaluating mechanical properties of plantar soft tissue**. This device is designed to evaluate the material properties of plantar soft tissue through a series of sophisticated features, including:

1. A testing table with a designated area corresponding to the sole of the foot.

2. A vertical reciprocating stress-strain testing unit for applying vertical tensile and compressive stresses to the plantar and measuring stress-strain responses.

3. A shear stress-strain testing unit for applying shear stresses to the plantar and measuring the results.

4. A torque stress-strain detection unit for applying torque and measuring the stress-strain responses.

5. A lifting mechanism that facilitates vertical movement of the testing units.

Through its compact structure and easy portability, this device enables multi-dimensional detection of the mechanical properties of the plantar, enhancing clinical testing capabilities.

Another significant patent by Huang is the **Method for etching back hard mask layer on tops of dummy polysilicon gates in gate last process**. This invention details a process that includes forming dummy gate structures, depositing and etching back a spin-on carbon layer, and utilizing remaining material as a mask for further etching. This method effectively saves one photomask and improves the process window, showcasing Huang's prowess in streamlining semiconductor fabrication processes.

Career Highlights

Throughout his career, Ran Huang has been associated with reputable organizations such as Shanghai Huali Integrated Circuit Corporation and Shanghai Huali Microelectronics Corporation. His work in these companies has contributed to significant advancements in integrated circuits and microelectronics, underlining his role as a pioneering inventor in these fields.

Collaborations

Ran Huang has collaborated with notable colleagues, including Xiaolin Cui and Qiuchen Xu, fostering a creative environment that contributes to innovative solutions and patents. These partnerships have enriched his work and expanded the impact of his inventions in various technological domains.

Conclusion

In conclusion, Ran Huang is a remarkable inventor whose contributions in Shanghai have been instrumental in evolving testing equipment for healthcare and enhancing semiconductor processes. With a focus on innovation and collaboration, his patents reflect his dedication to advancing technology and improving industry standards. The impact of his inventions promises to benefit both medical and technological fields in the years to come.

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