Company Filing History:
Years Active: 1991-2010
Title: **Raman Gobichettipalayam Viswanathan: A Pioneer in Lithographic Innovations**
Introduction
Raman Gobichettipalayam Viswanathan, a notable inventor based in Briarcliff Manor, NY, has made significant contributions to the field of lithography. With a prolific portfolio comprising 11 patents, his work stands at the intersection of advanced technologies and practical applications, particularly in optimizing lithographic processes.
Latest Patents
Among Raman's notable recent inventions is a patent titled "Method for lithography for optimizing process conditions." This innovative method introduces a novel approach to lithography, allowing for independent optimization of the resist process in multiple exposure steps on a single resist layer. By implementing separate post-exposure bakes for each exposure step, the resolution of patterns can be enhanced. This flexible technique is compatible with various lithographic methods and is particularly advantageous for hybrid lithography applications. Furthermore, it has been utilized in the fabrication of a device where active areas and gate levels are defined using separate masks with both e-beam and 248 nm sources.
Another significant patent in Raman's arsenal is for a "High resolution silicon-containing resist." This invention focuses on non-chemically amplified radiation-sensitive resist compositions that incorporate silicon, designed specifically for lithographic applications, including e-beam lithography. By employing a polymer that features both silicon-containing and radiation-sensitive moieties, this resist can effectively pattern features under 50 nm with minimal or no blur.
Career Highlights
Raman has made a mark in the industry through his role at the International Business Machines Corporation (IBM), where he has leveraged his expertise in material sciences to push the boundaries of lithographic technology. His contributions have not only advanced the capabilities of the industry but have also inspired further research and innovation.
Collaborations
Throughout his career, Raman has collaborated with esteemed colleagues, including Kam Leung Lee and David Andrew Lewis. These collaborations have played a crucial role in driving technological advancements and fostering a culture of innovation within their field.
Conclusion
As an inventor, Raman Gobichettipalayam Viswanathan exemplifies the spirit of innovation in lithography. With a solid foundation of patents and collaborations, his work continues to influence the domain, paving the way for future advancements and breakthroughs. His commitment to optimizing lithographic processes not only enhances industry practices but also fuels ongoing research that could shape the future of semiconductor fabrication and other related fields.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.