The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 1999
Filed:
Aug. 08, 1997
Applicant:
Inventors:
Raul Edmundo Acosta, White Plains, NY (US);
Jerome Paul Silverman, White Plains, NY (US);
Raman Gobichettipalayam Viswanathan, Briarcliff Manor, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378 85 ;
Abstract
An inventive mirror system for use in providing reflected X-ray radiation to a mask having pattern areas and opaque areas, comprising a plurality of parallel mirror segments which are vertically positioned with respect to each other at distances approximately equal to the widths of the corresponding opaque mask areas. In operation, radiation incident on each of the mirror segments is reflected to the patterned feature areas of the mask and skips over the opaque mask areas.