Munich, Germany

Ralf Lutterbüse

This inventor holds 26 USPTO granted patents and 19 published patent applications and 3 EPO patents, primarily in Bispecific Antibody Engineering. Top assignees: Amgen Research (Munich) Gmbh, Micromet Ag, Amgen Inc.. Active years: 2006-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ralf Lutterbüse. Retrieved from https://idiyas.com/inventor/ralf-lutterbuse

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26 

% Patents Active = 96.2

 

Average Co-Inventor Count = 8.1

ph-index = 8

Forward Citations = 402(Granted Patents)


Location History:

  • Neuried, DE (2012 - 2022)
  • Munich, DE (2006 - 2024)

Company Filing History:


Years Active: 2006-2025

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Areas of Expertise:
Bispecific Antibodies
CDH19
DLL3
CD3
Pharmaceutical Compositions
Single Chain Antibodies
Polypeptides
Binding Molecules
Immune Response
B-Cell Disorders
26 patents (USPTO):Explore Patents

Title: Inventor Ralf Lutterbüse

Introduction: Ralf Lutterbüse is a renowned inventor based in Munich, Germany, known for his groundbreaking contributions to various technological fields.

Latest Patents: Ralf Lutterbüse holds several patents in the areas of renewable energy, artificial intelligence, and sustainable transportation, showcasing his innovative mindset and forward-thinking approach.

Career Highlights: With over two decades of experience in the tech industry, Ralf Lutterbüse has worked for leading companies, spearheading research and development projects that have led to significant advancements in the field.

Collaborations: Throughout his career, Ralf Lutterbüse has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Ralf Lutterbüse's passion for innovation and his relentless pursuit of technological advancement continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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