Singapore, Singapore

Qunying Lin


Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2008-2013

where 'Filed Patents' based on already Granted Patents

13 patents (USPTO):

Title: The Innovative Mind of Qunying Lin

Introduction

Qunying Lin is a notable inventor based in Singapore, recognized for his significant contributions to the field of semiconductor manufacturing. With an impressive portfolio of 13 patents, Lin has established himself as a key figure in advancing technologies related to photolithography and radiation management in semiconductor devices.

Latest Patents

Among his latest inventions, Lin has developed methods for enhancing photolithography patterning. This innovative method fabricates semiconductor devices by utilizing a substrate prepared with a photoresist layer. It incorporates a photomask comprising two distinct patterns, each with specific pitch ranges. The technique also involves the creation of a composite aperture designed to improve the process windows for different ranges. Another notable patent is the "Method and apparatus for removing radiation side lobes," which addresses the challenge of managing unwanted radiation patterns. This invention utilizes a complex arrangement of radiation transparent and non-transparent regions to neutralize side lobes effectively in various regions.

Career Highlights

Throughout his career, Qunying Lin has honed his expertise while working at prestigious companies such as Chartered Semiconductor Manufacturing Ltd and GlobalFoundries Singapore Pte. Ltd. His work at these organizations has played a critical role in his development as an inventor and researcher in the semiconductor sector.

Collaborations

Lin's collaborative efforts have also been noteworthy. He has worked alongside skilled professionals like Sia Kim Tan and Liang-Choo Hsia, contributing to successful projects that have advanced the semiconductor industry. These collaborations reflect his commitment to innovation and excellence in technology.

Conclusion

In conclusion, Qunying Lin stands out as an influential inventor in the semiconductor field, with a strong focus on enhancing photolithography and managing radiation patterns. His achievements, supported by his extensive patent portfolio and collaborative efforts, underscore his substantial impact on the industry and highlight the importance of innovative thinking in technological advancements.

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